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Atomic Layer Deposition for Semiconductors
Springer-Verlag New York Inc.
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Springer-Verlag New York Inc.
Atomic Layer Deposition for Semiconductors
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
- | : Cheol Seong Hwang (Edited by)
- | Publisher: Springer-Verlag New York Inc.
- | Publication Date: Aug 23, 2016
- | Country of Publication: United States
- | Number of Pages: 263 pages
- | Language: Unknown
- | Binding: Paperback / softback
- | ISBN-10: 1489979433
- | ISBN-13: 9781489979438
- Author:
- Cheol Seong Hwang (Edited by)
- Publisher:
- Springer-Verlag New York Inc.
- Publication Date:
- Aug 23, 2016
- Country of Publication:
- United States
- Language:
- Unknown
- Number of pages:
- 263 pages
- Binding:
- Paperback / softback
- ISBN-10:
- 1489979433
- ISBN-13:
- 9781489979438